METHOD FOR REMOVING MATERIAL WITH LARGE DIELECTRIC CONSTANT FROM VAPOR DEPOSITION CHAMBER

摘要

PROBLEM TO BE SOLVED: To provide a method for removing a material with a dielectric constant larger than that of a silicon dioxide from at least a part of the surface of a reactor. SOLUTION: The method is configured so as to include a step for generating volatile products and boron-containing byproducts by introducing a first gas mixture including a boron-containing reaction agent into the reactor and causing the first gas mixture to react with a material contained in the reactor, a step for forming volatile products by introducing a second gas mixture including a fluorine-containing reaction agent into the reactor and causing the second gas mixture to react with the boron-containing byproducts contained in the reactor, and a step for removing the volatile products from the reactor. COPYRIGHT: (C)2005,JPO&NCIPI