SYSTEM FOR TREATING WASTE WATER GENERATED BY WORK OF CLEANING/REGENERATING COMPONENT OF SEMICONDUCTOR MANUFACTURING APPARATUS OR LIQUID CRYSTAL PANEL MANUFACTURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a system by which the work of treating the nitrate nitrogen-containing waste water generated by the work of cleaning/regenerating a component of a semiconductor manufacturing apparatus or a liquid crystal manufacturing apparatus can simply be done efficiently at a cost drastically lower than usual. SOLUTION: This system is provided with: a KOH tank for stripping an aluminum-made sputtered film on the surface of the component of the semiconductor manufacturing apparatus or the liquid crystal manufacturing apparatus; a water-washing tank for washing the component from which sputtered film is stripped; a denitration tank into which a KOH aqueous solution and waste water are made to flow, in which fine particles of a gewalt alloy having≤200μm particle size are put and which is kept in the environment of a pH of≥12 and a temperature of≤30°C at least while waste water is treated and; a KOH aqueous solution supplying pipeline and a pump for sending the spent KOH aqueous solution from the KOH tank to the denitration tank. COPYRIGHT: (C)2005,JPO&NCIPI