发明名称 |
COMPOSITION FOR ANTIREFLECTION FILM FORMATION |
摘要 |
<p>There is provided a composition for forming anti-reflective coating containing a urea compound substituted by hydroxyalkyl group or alkoxyalkyl group, and preferably a light absorbing compound and/or a light absorbing resin; a method of forming a anti-reflective coating for a semiconductor device by use of the composition; and a process for manufacturing a semiconductor device by use of the composition. The composition according to the present invention exhibits a good light-absorption to a light having a wavelength used for manufacturing a semiconductor device. Therefore, the composition exerts a high protection effect against light reflection, and has a high dry etching rate compared with photoresist layers.</p> |
申请公布号 |
EP1542075(A1) |
申请公布日期 |
2005.06.15 |
申请号 |
EP20030741346 |
申请日期 |
2003.07.11 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
KISHIOKA, TAKAHIRO;ARASE, SHINYA;MIZUSAWA, KEN-ICHI;NAKAYAMA, KEISUKE |
分类号 |
G03F7/11;C08K5/00;C08L61/24;C08L101/00;G03F7/09;H01L21/027;(IPC1-7):G03F7/11 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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