发明名称 |
Composition for forming organic insulating film and organic insulating film formed from the same |
摘要 |
Disclosed herein are a composition for forming an organic insulating film and an organic insulating film formed from the composition. The composition comprises an insulating polymer having a maleimide structure, a crosslinking agent and a photoacid generator so as to form a crosslinked structure. The organic insulating film has excellent chemical resistance to organic solvents used in a subsequent photolithographic process and improves the electrical properties of transistors. |
申请公布号 |
EP1542241(A1) |
申请公布日期 |
2005.06.15 |
申请号 |
EP20040257263 |
申请日期 |
2004.11.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD |
发明人 |
JEONG, EUN JEONG;KOO, BON WON;KIM, JOO YOUNG;KANG, IN NAM |
分类号 |
C08L35/00;H01B3/44;C08G61/12;C08G73/06;C08K5/00;C08L79/04;C08L101/00;C09D159/00;G03F7/004;G03F7/038;H01L21/312;H01L35/24;H01L51/05;H01L51/30 |
主分类号 |
C08L35/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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