发明名称 Composition for forming organic insulating film and organic insulating film formed from the same
摘要 Disclosed herein are a composition for forming an organic insulating film and an organic insulating film formed from the composition. The composition comprises an insulating polymer having a maleimide structure, a crosslinking agent and a photoacid generator so as to form a crosslinked structure. The organic insulating film has excellent chemical resistance to organic solvents used in a subsequent photolithographic process and improves the electrical properties of transistors.
申请公布号 EP1542241(A1) 申请公布日期 2005.06.15
申请号 EP20040257263 申请日期 2004.11.23
申请人 SAMSUNG ELECTRONICS CO., LTD 发明人 JEONG, EUN JEONG;KOO, BON WON;KIM, JOO YOUNG;KANG, IN NAM
分类号 C08L35/00;H01B3/44;C08G61/12;C08G73/06;C08K5/00;C08L79/04;C08L101/00;C09D159/00;G03F7/004;G03F7/038;H01L21/312;H01L35/24;H01L51/05;H01L51/30 主分类号 C08L35/00
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