发明名称 THREE-DIMENSIONAL NONWOVEN SUBSTRATE HAVING SUB-MILLIMETER ORIFICE STRUCTURE
摘要 The present invention is directed to a nonwoven fabric having a combination of a planar background element and projection elements to form a three-dimensional pattern, and a plurality of durable sub-millimeter orifices that extend at least partially through the depth of the three-dimensional pattern. The three-dimensional image of the non-apertured nonwoven fabric enhances the treatment, cleaning or cleansing performance due to pronounced surface projections that come in contact with the object to be treated or cleaned, and provide air passageways that are parallel to the plane of the substrate. Incorporation of sub-millimeter orifices in the nonwoven fabric, which extend through at least part of the nonwoven fabric, allow for transmission of fluids, as well as applied or embedded chemistries, from one side or surface of the substrate, or from a region internal to the nonwoven fabric, to the side which is in communication with the formed orifice.
申请公布号 EP1540060(A1) 申请公布日期 2005.06.15
申请号 EP20030771580 申请日期 2003.07.08
申请人 POLYMER GROUP, INC. 发明人 CARTER, NICK;MCCLOSKEY, MICHAEL;DELANEY, ANDREW
分类号 D04H1/00;A47L13/16;A47L13/17;A61F13/15;B26F1/26;D04H1/46;D04H3/10;D04H13/00 主分类号 D04H1/00
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