发明名称 Use of an organic dielectric as a sacrificial layer
摘要 A method for using an organic dielectric as a sacrificial layer for forming suspended or otherwise spaced structures. The use of an organic dielectric has a number of advantages, including allowing use of an organic solvent or etch to remove the sacrificial layer. Organic solvents only remove organic materials, and thus do not affect or otherwise damage non-organic layers such as metal layers. This may reduce or eliminate the need for the rinsing and drying steps often associated with the use of acidic etchants such as Hydrofluoric Acid.
申请公布号 US6905613(B2) 申请公布日期 2005.06.14
申请号 US20010902116 申请日期 2001.07.10
申请人 HONEYWELL INTERNATIONAL INC. 发明人 GUTIERREZ DAVID;LUCIANI VINCENT K.;BURGESS MARY C.
分类号 B81B3/00;(IPC1-7):B44C1/22;C23F1/00 主分类号 B81B3/00
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