发明名称 Wafer container and dusting prevention method thereof and method for containing wafer
摘要 There are provided a dust generation preventing structure of a wafer storage case and a process for preventing dust generation thereof, wherein dust generation is effectively prevented by blocking or suppressing free movement of particles constantly generated from a surface of a wafer storage case of a synthetic resin with a coating layer of a surfactant, and a wafer storing method using the wafer storage case. The wafer storage case of synthetic resin is used for housing wafers, and a surface of the wafer storage case is coated with a coating layer of a coating agent to prevent dust generation from the surface.
申请公布号 US6905731(B2) 申请公布日期 2005.06.14
申请号 US20010926173 申请日期 2001.09.18
申请人 SHIN-ETSU HANDOTAI CO., LTD. 发明人 MUNAKATA HIDEKI
分类号 H01L21/673;(IPC1-7):B05D3/00;B05D7/02;B05D7/22;B05D7/24;C08J7/04 主分类号 H01L21/673
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