发明名称 |
Wafer container and dusting prevention method thereof and method for containing wafer |
摘要 |
There are provided a dust generation preventing structure of a wafer storage case and a process for preventing dust generation thereof, wherein dust generation is effectively prevented by blocking or suppressing free movement of particles constantly generated from a surface of a wafer storage case of a synthetic resin with a coating layer of a surfactant, and a wafer storing method using the wafer storage case. The wafer storage case of synthetic resin is used for housing wafers, and a surface of the wafer storage case is coated with a coating layer of a coating agent to prevent dust generation from the surface.
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申请公布号 |
US6905731(B2) |
申请公布日期 |
2005.06.14 |
申请号 |
US20010926173 |
申请日期 |
2001.09.18 |
申请人 |
SHIN-ETSU HANDOTAI CO., LTD. |
发明人 |
MUNAKATA HIDEKI |
分类号 |
H01L21/673;(IPC1-7):B05D3/00;B05D7/02;B05D7/22;B05D7/24;C08J7/04 |
主分类号 |
H01L21/673 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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