发明名称 Semiconductor memory array of floating gate memory cells with buried floating gate
摘要 An array of floating gate memory cells, and a method of making same, where each pair of memory cells includes a pair of trenches formed into a surface of a semiconductor substrate, with a strip of the substrate disposed therebetween, a source region formed in the substrate strip, a pair of drain regions, a pair of channel regions each extending between the source region and one of the drain regions, a pair of floating gates each disposed in one of the trenches, and a pair of control gates. Each channel region has a first portion disposed in the substrate strip and extending along one of the trenches, a second portion extending underneath the one trench, a third portion extending along the one trench, and a fourth portion extending along the substrate surface and under one of the control gates.
申请公布号 US6906379(B2) 申请公布日期 2005.06.14
申请号 US20030653015 申请日期 2003.08.28
申请人 SILICON STORAGE TECHNOLOGY, INC. 发明人 CHEN BOMY;LEE DANA;TRAN HIEU VAN
分类号 H01L21/8247;H01L27/115;H01L29/423;H01L29/788;(IPC1-7):H01L29/788;H01L21/823 主分类号 H01L21/8247
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