发明名称 |
Method and apparatus for dressing polishing cloth |
摘要 |
A polishing cloth mounted on a turntable is dressed by bringing a dresser in contact with the polishing cloth for restoring the polishing capability of the polishing cloth. The dressing is performed by measuring heights of a surface of the polishing cloth at radial positions of the polishing cloth in a radial direction thereof determining a rotational speed of the dresser with respect to a rotational speed of the turntable on the basis of the measured heights, and dressing the polishing cloth by pressing the dresser are rotating. The dresser has an annular diamond grain layer or an annular SiC layer.
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申请公布号 |
US6905400(B2) |
申请公布日期 |
2005.06.14 |
申请号 |
US20020060366 |
申请日期 |
2002.02.01 |
申请人 |
EBARA CORPORATION |
发明人 |
KIMURA NORIO;ISHII YOU;NISHI TOYOMI;KAWAMOTO TAKAYOSHI;SAKURAI TAKESHI |
分类号 |
B24B49/00;B24B53/00;(IPC1-7):B24B1/00 |
主分类号 |
B24B49/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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