| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic projection apparatus in which a reaction force is generated between a balance mass and a substrate table. The balance mass is elastically coupled to the base frame with a suspension eigenfrequency of between 0.3 and 10 Hz.
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| 申请公布号 |
US6906786(B2) |
申请公布日期 |
2005.06.14 |
| 申请号 |
US20030454839 |
申请日期 |
2003.06.05 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
COX HENRIKUS HERMAN MARIE;VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS;VOSTERS PETRUS MATTHIJS HENRICUS;HOL SVEN ANTOIN JOHAN;CORNELISSEN SEBASTIAAN MARIA JOHANNES |
| 分类号 |
B23Q1/58;B23Q11/00;F16F15/02;G03F7/20;H01L21/027;(IPC1-7):G03B27/42;G03B27/58;G03B5/01 |
主分类号 |
B23Q1/58 |
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