method for manufacturing of phase shift blank mask and photo-mask,申请号KR20020064649-传众专利搜索

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发明名称	method for manufacturing of phase shift blank mask and photo-mask
摘要
申请公布号	KR100494442(B1)	申请公布日期	2005.06.13
申请号	KR20020064649	申请日期	2002.10.22
申请人		发明人
分类号	H01L21/027;(IPC1-7):H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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