发明名称 |
PHOTO MASK SHOWING IMPROVED RESOLUTION BY UTILIZING POLARIZATION OF LIGHT AND METHOD OF MANUFACTURING THE SAME |
摘要 |
A photo mask enhances the resolution of a photolithography process by polarizing the exposure light. The photo mask includes a transparent substrate made of quartz, a reflection pattern disposed on the transparent substrate, and a light-blocking pattern disposed on the reflection pattern. The external reflection pattern defines a light-transmitting area by exposing portions of the transparent substrate. The light-blocking pattern has the same size and shape as the external reflection pattern. |
申请公布号 |
KR20050054412(A) |
申请公布日期 |
2005.06.10 |
申请号 |
KR20030087981 |
申请日期 |
2003.12.05 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, SUNG HYUCK;SHIN, IN KYUN;YOON, GI SUNG |
分类号 |
H01L21/027;G03F1/14;G03F9/00;G21K5/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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