发明名称 MULTILAYER STRUCTURE FILM AND PROCESS FOR PRODUCING THE SAME
摘要 A multilayer structure film comprising first base crystal layer (33) composed of crystal grains adjacent to each other and second base crystal layer (34) whose thickness is greater than that of the first base crystal layer (33), extending over the upper surface of the first base crystal layer (33). The second base crystal layer (34) is composed of crystal grains having grown from individual crystal grains of the first base crystal layer (33). In the first and second base crystal layers (33, 35), fine uniform crystal grains are established. Moreover, in the first and second base crystal layers (33, 35), satisfactory layer thickness can be ensured. The multilayer structure film further comprises first and second magnetic crystal layers (35, 36) wherein fine uniform crystal grains are established. Moreover, in the first and second magnetic crystal layers (35, 36), satisfactory layer thickness can be ensured.
申请公布号 KR20050054955(A) 申请公布日期 2005.06.10
申请号 KR20057004860 申请日期 2005.03.21
申请人 FUJITSU LIMITED 发明人 MUKAI RYOICHI
分类号 G11B5/84;G11B5/851;(IPC1-7):G11B5/84 主分类号 G11B5/84
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