发明名称 COILING TYPE VACUUM VAPOR DEPOSITION METHOD AND COILING TYPE VACUUM VAPOR DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a coiling type vacuum vapor deposition method and a coiling type vacuum vapor deposition apparatus having excellent productivity capable of depositing a metal film without causing any thermal deformation on a base film consisting of a plastic single layer film. SOLUTION: An electron beam irradiation unit 21 to irradiate electron beams on a raw film 12 before performing vapor deposition of the metal film is arranged. A DC bias power supply 22 to apply the bias voltage between an auxiliary roller 18 and a can roller 14 to guide the raw film 12 after the film deposition is provided. The raw film 12 charged by the irradiation of electron beams is tightly attached to the can roller 14 before performing vapor deposition of the metal film, and the raw film 12 is tightly attached to the can roller 14 by the bias voltage applied between the metal film electrically connected to the auxiliary roller 18 and the can roller 14 after performing vapor deposition of the metal film. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005146401(A) 申请公布日期 2005.06.09
申请号 JP20030390105 申请日期 2003.11.20
申请人 ULVAC JAPAN LTD 发明人 HAYASHI NOBUHIRO;HIRONO TAKAHIRO;TADA ISAO;NAKATSUKA ATSUSHI
分类号 C23C14/02;C23C14/14;C23C14/56;G11B5/85;(IPC1-7):C23C14/56 主分类号 C23C14/02
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