发明名称 |
COILING TYPE VACUUM VAPOR DEPOSITION METHOD AND COILING TYPE VACUUM VAPOR DEPOSITION APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a coiling type vacuum vapor deposition method and a coiling type vacuum vapor deposition apparatus having excellent productivity capable of depositing a metal film without causing any thermal deformation on a base film consisting of a plastic single layer film. SOLUTION: An electron beam irradiation unit 21 to irradiate electron beams on a raw film 12 before performing vapor deposition of the metal film is arranged. A DC bias power supply 22 to apply the bias voltage between an auxiliary roller 18 and a can roller 14 to guide the raw film 12 after the film deposition is provided. The raw film 12 charged by the irradiation of electron beams is tightly attached to the can roller 14 before performing vapor deposition of the metal film, and the raw film 12 is tightly attached to the can roller 14 by the bias voltage applied between the metal film electrically connected to the auxiliary roller 18 and the can roller 14 after performing vapor deposition of the metal film. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005146401(A) |
申请公布日期 |
2005.06.09 |
申请号 |
JP20030390105 |
申请日期 |
2003.11.20 |
申请人 |
ULVAC JAPAN LTD |
发明人 |
HAYASHI NOBUHIRO;HIRONO TAKAHIRO;TADA ISAO;NAKATSUKA ATSUSHI |
分类号 |
C23C14/02;C23C14/14;C23C14/56;G11B5/85;(IPC1-7):C23C14/56 |
主分类号 |
C23C14/02 |
代理机构 |
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主权项 |
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