发明名称 Semiconductor device and method for manufacturing the same
摘要 A semiconductor device comprises a lower electrode shaped as a convex formed on a semiconductor substrate having crystals, a grain boundary between adjacent crystals being perpendicular to a side of the lower electrode, a capacitor insulating film covering the lower electrode, and an upper electrode formed on the capacitor insulating film.
申请公布号 US2005121713(A1) 申请公布日期 2005.06.09
申请号 US20050033257 申请日期 2005.01.12
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 TOSHIBA KABUSHIKI K.;EGUCHI KAZUHIRO
分类号 H01L27/108;H01L21/02;H01L21/8242;(IPC1-7):H01L27/108;H01L29/76;H01L29/94;H01L31/119;H01L29/00 主分类号 H01L27/108
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