发明名称 METHOD AND SYSTEM FOR MONITORING IC PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a method and a system for determining process uniformity. SOLUTION: This method includes a step of selecting a plurality of sample regions. The plurality of the sample regions include a plurality of features to be processed, and each of the plurality of the sample regions includes at least one of a plurality of processed features. Each of the plurality of processed features is originated from at least one production process. Moreover, the method includes a step of obtaining a plurality of electron microscopic images associated respectively with the plurality of sample regions, a step of processing the information associated with the plurality of electron microscopic images, and a step of determining a plurality of first grayscale values of the plurality of sample regions. Furthermore, the method includes a step of processing the information associated with the plurality of first grayscale values and a step of determining whether or not the at least one production process is uniform. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005150727(A) 申请公布日期 2005.06.09
申请号 JP20040326985 申请日期 2004.11.10
申请人 HERMES-MICROVISION (TAIWAN) INC 发明人 JAU JACK;SRINIVASAN SANDARARAJAN
分类号 H01L21/66;G06K9/00;G06T7/00;H01L21/00;H01L21/02;H01L21/3205;H01L23/52;(IPC1-7):H01L21/66;H01L21/320 主分类号 H01L21/66
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