ELECTRODE FORMING METHOD, CAPACITOR ELEMENT, AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To microminiaturize electrodes constituting a capacitor element, and to provide a method of manufacturing a capacitor element equipped with the microminiaturized electrodes. SOLUTION: The method of manufacturing the capacitor element comprises processes of: forming a first conductive film on a semiconductor substrate; forming a first linear mask pattern which extends in a first direction on the first conductive film; etching the first conductive film by the use of the first mask pattern to form a conductive film pattern; forming a dielectric film and a second conductive film successively in this sequence on the semiconductor substrate; forming a second linear mask pattern which extends in a second direction different from the first direction on the second conductive film; and etching the second conductive film, the dielectric film, and the conductive film pattern by the use of the second mask pattern to form the capacitor element composed of a capacitor lower electrode, a capacitor insulating film, and a capacitor upper electrode. COPYRIGHT: (C)2005,JPO&NCIPI