METHOD OF MANUFACTURING SUBSTRATE FOR ELECTROOPTIC DEVICE, ELECTROOPTIC DEVICE, SUBSTRATE THEREFOR AND ELECTRONIC APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an electrooptic substrate constituted by laminating a thin semiconductor film upon the substrate body without performing any high-temperature long-time heat treatment that causes the warping of the substrate or the defects of a semiconductor. SOLUTION: After an insulating layer is formed in a semiconductor substrate by the SIMOX method, a laminated substrate is formed by sticking the insulating layer to the substrate body, and the unnecessary laminated section other than a semiconductor layer is removed which becomes the active layer of a switching element. The film thickness of the semiconductor layer can be adjusted by the ion accelerating voltage applied during forming the insulating layer by the SIMOX method. COPYRIGHT: (C)2005,JPO&NCIPI