发明名称 |
Electron beam duplication lithography method and apparatus |
摘要 |
An electron beam duplication lithography apparatus and method for focusing electrons emitted from a mask plate as a result of an application of an electric field between a mask plate and a duplication plate. Irradiation of electrons from the mask plate is assisted through an electric field lens or magnetic field lens, or a combination thereof from an electron field emission material formed into a pattern on a flat surface of a substrate. The result is that a congruent or similar pattern is lithographed by electron beam exposure onto an electron beam resist film from a field emission film having the congruent or similar pattern to be created.
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申请公布号 |
US2005121623(A1) |
申请公布日期 |
2005.06.09 |
申请号 |
US20050040202 |
申请日期 |
2005.01.21 |
申请人 |
SI DIAMOND TECHNOLOGY, INC. |
发明人 |
IWAMATSU SEIICHI |
分类号 |
A61N5/00;G21G5/00;H01J37/30;H01J37/317;(IPC1-7):A61N5/00 |
主分类号 |
A61N5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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