| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and method for electron beam proximity exposure, where operable exposure conditions can be relaxed for improving the throughput. SOLUTION: By introducing trace small amount of gas into the casing of the column 10 and a chamber 8, the level of vacuum is lowered to suppress the variance of the diameters of electronic beams, due to space charge effect. Thus, the exposure conditions, such as an electron beam current quantity, are relaxed to improve the throughput in electron beam proximity exposure. COPYRIGHT: (C)2005,JPO&NCIPI
|
