发明名称 |
Lichtannäherungs-Korrekturverfahren |
摘要 |
A method of correcting light proximity effects includes the steps of: compressing design data of a circuit pattern (step S1); generating a projection image which is formed during a process of transferring a pattern onto a wafer, the projection image being generated according to the design data (step S2); predicting the size of the transferred pattern, said prediction being performed from the projection image (step S3); calculating the difference between the predicted size of the transferred pattern and the pattern size designated by the design data (step S4); correcting the compressed design data by an amount equal to the above-described difference (step S5); judging whether the correction amount is within an allowable range (step S6); expanding the corrected data after the correction amount has fallen within the allowable range (step S7); and outputting the resultant data (step S8). |
申请公布号 |
DE19534132(B4) |
申请公布日期 |
2005.06.09 |
申请号 |
DE1995134132 |
申请日期 |
1995.09.14 |
申请人 |
MITSUBISHI DENKI K.K., TOKIO/TOKYO |
发明人 |
KAMON, KAZUYA |
分类号 |
H01L21/82;G03F1/36;G03F1/68;G03F1/70;G03F7/20;G06F17/50;G06T9/00 |
主分类号 |
H01L21/82 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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