| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing an electrophotographic photoreceptor by which abnormal grown can be significantly decreased and both of high quality and a low cost can be achieved in a high level. SOLUTION: The method aims to manufacture an electrophotographic photoreceptor having at least an adhesion layer and a light accepting layer formed on a conductive substrate by a plasma CVD method. The light accepting layer is formed under the following manufacture conditions by plasma CVD. They are: when a layered film and a substrate obtained by forming an adhesion layer on a glass substrate or on a substrate equivalent to the glass substrate, and a light-accepting layer formed to 5.0μm thickness on the adhesion layer, are subjected to a micro-scratch test, the critical load for fracture ranges from 50 mN to 700 mN. COPYRIGHT: (C)2005,JPO&NCIPI
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