发明名称 PLASMA SOURCE WITH SEGMENTED MAGNETRON CATHODE
摘要 A plasma source includes a chamber for containing a feed gas. An anode is positioned in the chamber. A segmented magnetron cathode comprising a plurality of electrically isolated magnetron cathode segments is positioned in the chamber proximate to the anode. A power supply is electrically connected to an electrical input of a switch. A respective one of the plurality of electrical outputs of the switch is electrically connected to a respective one of the plurality of magnetron cathode segments. The power supply generates a train of voltage pulses that ignites a plasma from the feed gas. Individual voltage pulses in the train of voltage pulses are routed by the switch in a predetermined sequence to at least two of the plurality of magnetron cathode segments.
申请公布号 WO2005052979(A2) 申请公布日期 2005.06.09
申请号 WO2004US36636 申请日期 2004.11.04
申请人 ZOND, INC.;CHISTYAKOV, ROMAN 发明人 CHISTYAKOV, ROMAN
分类号 C23C14/00;C23C14/34;C23C14/35;C23C14/54;H01J37/34 主分类号 C23C14/00
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