发明名称 |
Patterning method |
摘要 |
The invention relates to a method for creating a pattern on a substrate comprising a first alignment structure, using an elastomeric stamp comprising a patterning structure and a second alignment structure. The method comprises a moving step for moving the elastomeric stamp towards the substrate, and a deformation step for deforming the patterning structure with a tensile or compressive force generated by cooperation of the first alignment structure and the second alignment structure.
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申请公布号 |
US2005124092(A1) |
申请公布日期 |
2005.06.09 |
申请号 |
US20050485419 |
申请日期 |
2005.02.02 |
申请人 |
BONA GIAN-LUCA;MICHEL BRUNO;ROTHUIZEN HUGO E.;VETTIGER PETER;BIEBUYCK HAN |
发明人 |
BONA GIAN-LUCA;MICHEL BRUNO;ROTHUIZEN HUGO E.;VETTIGER PETER;BIEBUYCK HAN |
分类号 |
G02B5/18;G03F7/00;G03F9/00;(IPC1-7):H01L21/48 |
主分类号 |
G02B5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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