发明名称 Patterning method
摘要 The invention relates to a method for creating a pattern on a substrate comprising a first alignment structure, using an elastomeric stamp comprising a patterning structure and a second alignment structure. The method comprises a moving step for moving the elastomeric stamp towards the substrate, and a deformation step for deforming the patterning structure with a tensile or compressive force generated by cooperation of the first alignment structure and the second alignment structure.
申请公布号 US2005124092(A1) 申请公布日期 2005.06.09
申请号 US20050485419 申请日期 2005.02.02
申请人 BONA GIAN-LUCA;MICHEL BRUNO;ROTHUIZEN HUGO E.;VETTIGER PETER;BIEBUYCK HAN 发明人 BONA GIAN-LUCA;MICHEL BRUNO;ROTHUIZEN HUGO E.;VETTIGER PETER;BIEBUYCK HAN
分类号 G02B5/18;G03F7/00;G03F9/00;(IPC1-7):H01L21/48 主分类号 G02B5/18
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