发明名称 METHOD AND APPARATUS FOR TREATING AQUEOUS HALOGEN COMPOUND SOLUTION, AQUEOUS ACIDIC SOLUTION OR ACIDIC GAS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for efficiently making an aqueous halogen compound solution, an aqueous acidic solution or an acidic gas harmless; and to provide a method for treating efficiently and an apparatus having durability. <P>SOLUTION: The method for treating the aqueous halogen compound solution, the aqueous acidic solution or the acidic gas comprises introducing an aqueous solution containing hydrogen chloride into a dissolution tank 30 accommodating a granular substance or a particulate substance comprising calcium hydroxide or calcium carbonate, reacting the aqueous solution in the dissolution tank 30 to convert the aqueous solution containing hydrogen chloride into an aqueous solution containing calcium chloride, introducing the aqueous halogen compound solution, or the like, into a precipitation tank 20, to which the converted aqueous solution containing the calcium chloride is fed, so as to precipitate the aqueous halogen compound solution, or the like, as respective hardly soluble calcium compounds, taking out the resulting precipitate, thereafter, introducing an aqueous solution containing hydrogen chloride in the precipitation tank 20 after precipitation into the dissolution tank 30 so as to convert the aqueous solution containing hydrogen chloride into a solution containing calcium chloride, and again circulating the solution containing calcium chloride to the precipitation tank 20. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005145818(A) 申请公布日期 2005.06.09
申请号 JP20040378748 申请日期 2004.12.28
申请人 KIN KISHUN 发明人 KIN KISHUN;MINAMI WATARU
分类号 B01D53/68;B01D53/77;C01F11/22;C01F11/24;C02F1/58;(IPC1-7):C01F11/22 主分类号 B01D53/68
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