| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a coating treatment apparatus for supplying a treated liquid to a slit nozzle without including gas in the treated liquid. <P>SOLUTION: The slit nozzle 41 is arranged on a filling pot PT1 and a resist liquid is supplied from a supply port 46. The resist liquid flows out of a slit 41b while allowed to fill the slit nozzle 41 to be stored in the filling pot PT1. Since air included in the resist liquid disappears when the resist liquid flows out of the slit 41b or disappears from the surface of the resist liquid, the inclusion degree of air in the resist liquid is reduced. When the slit 41b is immersed in the resist liquid and the resist liquid is stored in an amount corresponding to the internal volume of the slit nozzle 41, the supply of the resist liquid is stopped and the stored resist liquid is sucked by a suction pump 98. By this constitution, the slit nozzle 41 is substituted and filled with the resist liquid, which is reduced in the inclusion ratio of air, stored in the filling pot PT1. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
