发明名称 |
Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation |
摘要 |
A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation, and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is arranged to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction.
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申请公布号 |
US2005121624(A1) |
申请公布日期 |
2005.06.09 |
申请号 |
US20030727035 |
申请日期 |
2003.12.04 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
IVANOV VLADIMIR V.;BANINE VADIM Y.;KOSHELEV KONSTANTIN N. |
分类号 |
G21K5/02;G03F7/20;H01L21/027;H05G2/00;(IPC1-7):G03C5/16 |
主分类号 |
G21K5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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