发明名称 PROCESS FOR MAKING DENSE MIXED METAL Si3N4 TARGETS
摘要 A composition and method for fabricating high-density Ta-Al-O, Ta-Si-N, and W-Si-N sputtering targets, having particular usefulness for the sputtering of heater layers for ink jet printers. Compositions in accordance with the invention comprise a metal component, Si3N4, and a sintering aid so that the targets will successfully sputter without cracking, etc. The components are combined in powder form and pressure consolidated under heated conditions for a time sufficient to form a consolidated blend having an actual density of greater that about 95% of the theoretical density. The consolidated blend may then be machined so as to provide the final desired target shape.
申请公布号 WO2004024452(A3) 申请公布日期 2005.06.09
申请号 WO2003US27145 申请日期 2003.08.27
申请人 TOSOH SMD, INC.;SMATHERS, DAVID, B.;VALENT, FRANCIS, S.;REGAN, MICHAEL, J.;HEWLETT-PACKARD CO. 发明人 SMATHERS, DAVID, B.;VALENT, FRANCIS, S.;REGAN, MICHAEL, J.
分类号 B32B9/00;B32B15/04;B41J;C04B35/64;C23C14/34 主分类号 B32B9/00
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