| 摘要 |
PROBLEM TO BE SOLVED: To provide an illumination optical system capable of uniformly illuminating a surface to be illuminated even when an integrated light integrator is used, and to provide an exposure system. SOLUTION: The illumination optical system illuminates the surface with a specified pattern formed thereon by using a luminous flux emitted from a light source under Koehler's illumination. In the illumination optical system, the system has the light integrator forming a secondary light source uniformly illuminating the surface to be illuminated and having a plurality of elements directly formed on a substrate and used for uniformly illuminating the surface to be illuminated. In the system, the system further has a condenser condensing the luminous flux passed through the light integrator, and a means for preventing an irradiation to the surface to be illuminated of the luminous flux rectilinearly propagating on joints among a plurality of the elements having no equalizing function. The exposure system with the illumination optical system is included. COPYRIGHT: (C)2005,JPO&NCIPI
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