发明名称 SUBSTRATE PROCESSING DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing device having a chemical pollutant measuring device capable of realizing an evaluation of pollution caused by a chemical pollutant by classifying an organic matter at several steps of boiling levels and showing respective concentration levels. SOLUTION: The substrate processing device comprises a housing 11 for housing a process tube 26 in which a processing chamber 25 for processing a substrate 1 is formed, a quartz crystal 75 placed in the housing 11 and exposed to an atmosphere in the housing, temperature controllers 70, 73 for heating a temperature of the quartz crystal 75, a detecting part 77 for detecting an oscillation frequency of the quartz crystal 75, a temperature controller 74 for controlling the temperature controllers 70, 73 so as to increase the temperature of the quartz crystal in stages, and a controlling part 78 for computing a quantity and concentration of a plurality of types of an organic matter having different boiling points by respectively detecting the frequency of the quartz crystal at each stage by the detecting part 77. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005150562(A) 申请公布日期 2005.06.09
申请号 JP20030388662 申请日期 2003.11.19
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 TAKAMI EIKO;SASAJIMA RYOTA;TANIGUCHI TAKESHI;NAKAMURA NAOTO
分类号 G01N5/02;C23C16/44;H01L21/205;(IPC1-7):H01L21/205 主分类号 G01N5/02
代理机构 代理人
主权项
地址