| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device which can prevent the positional deviation of a mask. SOLUTION: This scanning exposure device which transfers a pattern formed on a mask 12 to a substrate 16 by relatively moving the mask 12 and the substrate 16 in synchronization comprises a mask hold member 18 for placing the mask 12 thereon, a mask stage 20 for moving the mask hold member 18, and pressing means 72, 88a and 88b for pressing the mask 12 against the mask hold member 18. COPYRIGHT: (C)2005,JPO&NCIPI |
