发明名称 |
VERFAHREN ZUR HERSTELLUNG VON SUBMIKRON MUSTERN AUF FILMEN |
摘要 |
A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film. |
申请公布号 |
DE60019974(D1) |
申请公布日期 |
2005.06.09 |
申请号 |
DE2000619974 |
申请日期 |
2000.12.22 |
申请人 |
THE UNIVERSITY OF MASSACHUSETTS, BOSTON;UNIVERSITAET KONSTANZ |
发明人 |
STEINER, ULLRICH;THURN-ALBRECHT, THOMAS;SCHAFFER, ERIK;RUSSEL, THOMAS P.;MYLNEK, JURGEN |
分类号 |
G03F7/20;B81C99/00;G03F7/00;H01L21/3105;H05K3/00;(IPC1-7):B05D5/06 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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