发明名称 VERFAHREN ZUR HERSTELLUNG VON SUBMIKRON MUSTERN AUF FILMEN
摘要 A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film.
申请公布号 DE60019974(D1) 申请公布日期 2005.06.09
申请号 DE2000619974 申请日期 2000.12.22
申请人 THE UNIVERSITY OF MASSACHUSETTS, BOSTON;UNIVERSITAET KONSTANZ 发明人 STEINER, ULLRICH;THURN-ALBRECHT, THOMAS;SCHAFFER, ERIK;RUSSEL, THOMAS P.;MYLNEK, JURGEN
分类号 G03F7/20;B81C99/00;G03F7/00;H01L21/3105;H05K3/00;(IPC1-7):B05D5/06 主分类号 G03F7/20
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