发明名称 |
MICROWAVE-EXCITED PLASMA TREATMENT APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a microwave-excited plasma treatment apparatus wherein a range of pressure for normal discharge and a range of electric power for application are widened by shaping an aperture facing a rectangular waveguide into slits for homogenizing a microwave field and a magnetic field just below a microwave introduction window under a microwave antenna. <P>SOLUTION: In this microwave-excited plasma treatment apparatus, the rectangular waveguide is provided in contact with a microwave introducing window on an upper wall of a vacuum chamber. Four elliptical slits are opened in the plane wherein the rectangular waveguide is in contact with the microwave introducing window, and are arranged in an approximately regular tetragon with each slit constituting a side of the square. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005150473(A) |
申请公布日期 |
2005.06.09 |
申请号 |
JP20030387057 |
申请日期 |
2003.11.17 |
申请人 |
ULVAC JAPAN LTD;NIHON KOSHUHA CO LTD |
发明人 |
TAGUCHI YOJI;YOSHIDA MAIKO;KUSABA YASUTA;SHINOHARA KIBATSU;MATSUO MUNEKAZU;WATANABE KAZUHIRO |
分类号 |
H05H1/46;H01J37/32;H01L21/02;H01L21/3065 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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