发明名称 ILLUMINATION OPTICAL APPARATUS, ALIGNER, AND METHOD FOR EXPOSURE
摘要 PROBLEM TO BE SOLVED: To introduce a rectangular parallel luminous flux supplied from, for example, an excimer laser light source to the entrance of the main body of an aligner by shaping the luminous flux to a parallel luminous flux having a desired cross-sectional dimension based on a relatively simple constitution that is reduced in light quantity loss and manufacturing cost. SOLUTION: An illumination optical apparatus is provided with a first shaping optical system (21) which is disposed in the optical path between a light source (1) and a prescribed surface (5a), and emits an incident parallel luminous flux in the state of an almost parallel incident luminous flux by expanding or contracting the cross section of the incident luminous flux in one direction; and a second shaping optical system (22) which is disposed in the optical path between the first shaping optical system (21) and prescribed surface (5a), and emits an incident almost parallel luminous flux in the state of an almost parallel luminous flux by expanding or contracting the cross section of the incident luminous flux in one direction. At least either one of the first and second shaping optical systems (21 and 22) is constituted to rotate around the optical axis of the illumination optical apparatus. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005150542(A) 申请公布日期 2005.06.09
申请号 JP20030388305 申请日期 2003.11.18
申请人 NIKON CORP 发明人 TOYODA MITSUNORI
分类号 G02B19/00;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02B19/00
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