发明名称 Method of manufacturing electro-optical device and annealing device for transparent substrate
摘要 Exemplary embodiments of the invention provide, on a transparent substrate, at least a part of at least one of wiring lines, electronic elements, and pixel electrodes formed by film-forming. Before and after the film-forming, an interlayer insulating film is formed. After the film-forming or the interlayer insulation, a heat treatment is performed on the transparent substrate in a single substrate process by a heater. Thus, it is possible to manufacture an electro-optical device with good productivity and high efficiency.
申请公布号 US2005121739(A1) 申请公布日期 2005.06.09
申请号 US20040981635 申请日期 2004.11.05
申请人 SEIKO EPSON CORPORATION 发明人 FUKUHARA KEIJI
分类号 G02F1/1368;G02F1/13;G02F1/136;G02F1/1362;G09F9/00;H01L21/00;H01L21/31;H01L21/477;H01L31/00;(IPC1-7):H01L21/00 主分类号 G02F1/1368
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