Method of Preparing a Substrate, Method of Measuring, Device Manufacturing Method, Lithographic Apparatus, Computer Program and Substrate

摘要

A plurality of markers are printed in resist on a substrate at a range of angles relative to a crystal axis of the substrate. The markers are etched in to the substrate using an anisotropic etch process, the markers being such that after the etch their apparent positions are dependent on their orientation relative to the crystal axis. The apparent positions of the markers are measured and from this the orientation of the crystal axis is derived.