| 摘要 |
Disclosed is a magnetron sputtering source, comprising at least two long targets (3a, 3b, 3c) which are electrically insulated from each other and arranged next to each other in a longitudinal direction. The lateral spacing is substantially smaller than the corresponding spreading of the targets (3a, 3b, 3c). Each target has its own electrical connection (5a, 5b, 5c). Anodes (7a, 7b) are provided preferably between the targets (3a, 3b, 3c).
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