发明名称 |
System for plasma treatment of gases in a vacuum pump |
摘要 |
The system includes a pumping assembly (2) with a vacuum pump body having multiple pumping stages (5-9), and a pumped gas treatment system. The pumped gas treatment system has plasma sources (15, 16) housed inside the vacuum pump body of the pumping assembly for generating plasma that decomposes partly some gas traversing the pumping assembly. |
申请公布号 |
EP1538656(A1) |
申请公布日期 |
2005.06.08 |
申请号 |
EP20040292798 |
申请日期 |
2004.11.26 |
申请人 |
ALCATEL |
发明人 |
MAQUIN, PHILIPPE;NEEL, THIERRY;BERNARD, ROLAND |
分类号 |
H05H1/00;B01D53/34;B01D53/38;B01D53/70;B01J3/02;C23C16/44;H01J37/32;H01L21/31;H05H1/46 |
主分类号 |
H05H1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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