发明名称 System for plasma treatment of gases in a vacuum pump
摘要 The system includes a pumping assembly (2) with a vacuum pump body having multiple pumping stages (5-9), and a pumped gas treatment system. The pumped gas treatment system has plasma sources (15, 16) housed inside the vacuum pump body of the pumping assembly for generating plasma that decomposes partly some gas traversing the pumping assembly.
申请公布号 EP1538656(A1) 申请公布日期 2005.06.08
申请号 EP20040292798 申请日期 2004.11.26
申请人 ALCATEL 发明人 MAQUIN, PHILIPPE;NEEL, THIERRY;BERNARD, ROLAND
分类号 H05H1/00;B01D53/34;B01D53/38;B01D53/70;B01J3/02;C23C16/44;H01J37/32;H01L21/31;H05H1/46 主分类号 H05H1/00
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