发明名称 Device and method for large area lithography
摘要 <p>Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104;105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114;116)are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template. <IMAGE></p>
申请公布号 EP1538482(A1) 申请公布日期 2005.06.08
申请号 EP20030445141 申请日期 2003.12.05
申请人 OBDUCAT AB 发明人 HEIDARI, BABAK;BECK, MARC
分类号 G03F7/00;B82Y10/00;B82Y40/00;G03F7/20;H05K3/00;H05K3/10;(IPC1-7):G03F7/00 主分类号 G03F7/00
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