ETCHING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE,申请号KR20040100586-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	ETCHING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
摘要
申请公布号	KR20050053349(A)	申请公布日期	2005.06.08
申请号	KR20040100586	申请日期	2004.12.02
申请人	SONY CORPORATION	发明人	NISHIDA TOMOYA
分类号	H01L21/3063;H01L21/306;H01L21/335;H01L21/8234;H01L27/088;H01L27/095;(IPC1-7):H01L21/306	主分类号	H01L21/3063
代理机构		代理人
主权项
地址

您可能感兴趣的专利

ANALOG ELECTRONIC TIMEPIECE

VENTILATING SYSTEM FOR STORE FURNISHED WITH FREEZING AND REFRIGERATING SHOWCASE

PLASMA X-RAY EXPOSURE APPARATUS

SEMICONDUCTOR DEVICE

IMAGE FORMING DEVICE

DEVICE FOR MEASURING RADIOACTIVITY IN WATER

AUTOMATIC ORIGINAL FEEDER

DRY ETCHING DEVICE

AIR WASHER OF VENTILATING AND AIR-CONDITIONING EQUIPMENT

METHOD FOR MEASURING HEAT CURRENT AMOUNT

HEAT ACCUMULATING MATERIAL

PRODUCTION OF ROCKER ARM

CONTROLLING METHOD OF COOLING SPEED IN MOLD

INPUTTING SYSTEM OF DATA

MEASURING DEVICE FOR VISCOSITY AND DENSITY

METHOD AND APPARATUS FOR MEASURING SURFACE TEMPERATURE OF STEEL MATERIAL IN HORIZONTALLY MOVING TYPE CONTINUOUS HEATING FURNACE