| 发明名称 |
MATERIALS FOR POLISHING LIQUID FOR METAL, POLISHING LIQUID FOR METAL, METHOD FOR PREPARATION THEREOF AND POLISHING METHOD USING THE SAME |
| 摘要 |
<p>Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.</p> |
| 申请公布号 |
EP1150341(A4) |
申请公布日期 |
2005.06.08 |
| 申请号 |
EP19990961474 |
申请日期 |
1999.12.28 |
| 申请人 |
HITACHI CHEMICAL COMPANY, LTD.;HITACHI, LTD. |
发明人 |
UCHIDA, TAKESHI;HOSHINO, TETSUYA;TERAZAKI, HIROKI;KAMIGATA, YASUO;KOYAMA, NAOYUKI;HONMA, YOSHIO;KONDOH, SEIICHI |
| 分类号 |
B24B37/00;C09G1/02;C09K13/00;C23F3/00;H01L21/321;(IPC1-7):H01L21/321 |
主分类号 |
B24B37/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
