发明名称 |
APPARATUS AND METHOD FOR USE OF OPTICAL SYSTEM WITH PLASMA PROCESSING SYSTEM |
摘要 |
A plasma processing system (10) and method for operating an optical system (12) in conjunction with a plasma processing system are provided. The plasma processing system includes an optical system in communication with a plasma processing chamber (14) of the plasma processing system. The optical system has a window (13) and is constructed and arranged to detect a plasma process condition through the window and a transmission condition of the window. The method includes detecting an optical emission (A) from the plasma processing region and monitoring contamination of a window provided by the optical system.
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申请公布号 |
KR20050053715(A) |
申请公布日期 |
2005.06.08 |
申请号 |
KR20057005500 |
申请日期 |
2005.03.30 |
申请人 |
TOKYO ELECTRON LTD. |
发明人 |
LUDVIKSSON AUDUNN;MITROVIC ANDREJ |
分类号 |
G01L21/30;H01J37/32;H05H1/00;(IPC1-7):H01J37/32 |
主分类号 |
G01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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