发明名称 APPARATUS AND METHOD FOR USE OF OPTICAL SYSTEM WITH PLASMA PROCESSING SYSTEM
摘要 A plasma processing system (10) and method for operating an optical system (12) in conjunction with a plasma processing system are provided. The plasma processing system includes an optical system in communication with a plasma processing chamber (14) of the plasma processing system. The optical system has a window (13) and is constructed and arranged to detect a plasma process condition through the window and a transmission condition of the window. The method includes detecting an optical emission (A) from the plasma processing region and monitoring contamination of a window provided by the optical system.
申请公布号 KR20050053715(A) 申请公布日期 2005.06.08
申请号 KR20057005500 申请日期 2005.03.30
申请人 TOKYO ELECTRON LTD. 发明人 LUDVIKSSON AUDUNN;MITROVIC ANDREJ
分类号 G01L21/30;H01J37/32;H05H1/00;(IPC1-7):H01J37/32 主分类号 G01L21/30
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