发明名称 Semiconductor laser device and method of fabricating the same
摘要 An n-contact layer, an n-cladding layer, an MQW active layer, and a p-first cladding layer are formed in this order on a sapphire substrate. An n-current blocking layer having a striped opening is formed on the p-first cladding layer. The width of the striped opening gradually increases from W 2 to W 1 as the depth thereof decreases from a lower layer to an upper layer in the current blocking layer. A p-second cladding layer is formed on the n-current blocking layer and on the p-first cladding layer inside the striped opening. The p-second cladding layer comprises a lower layer having the width W 2 at its lower end and an upper layer having a width W 1 lager than the width W 2.
申请公布号 US6904071(B1) 申请公布日期 2005.06.07
申请号 US20000532791 申请日期 2000.03.22
申请人 SANYO ELECTRIC CO., LTD. 发明人 GOTO TAKENORI;HAYASHI NOBUHIKO
分类号 H01L33/06;H01L33/14;H01L33/32;H01S5/065;H01S5/22;H01S5/223;H01S5/323;H01S5/343;(IPC1-7):H01S5/00 主分类号 H01L33/06
代理机构 代理人
主权项
地址