发明名称 Fabrication of microstructures with vacuum-sealed cavity
摘要 A cavity forming formed in an encapsulation structure under a vacuum in a vacuum chamber is sealed with a capping layer. A stiff protective layer under tensile stress is deposited on the capping layer prior to venting the vacuum chamber to atmospheric pressure. The capping layer is preferably aluminum or an aluminum alloy, and the protective layer is preferably delta-TiN having a suitable high Young's modulus.
申请公布号 US6902656(B2) 申请公布日期 2005.06.07
申请号 US20020153593 申请日期 2002.05.24
申请人 DALSA SEMICONDUCTOR INC. 发明人 OUELLET LUC;ANTAKI ROBERT;TREMBLAY YVES
分类号 B22F1/00;B81B7/00;C23C14/00;C23C14/06;C23C14/32;G01C19/56;G01P15/08;(IPC1-7):C23C14/35;H01L21/00 主分类号 B22F1/00
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