发明名称 SUBSTRATE SUPPORTING PLATE AND STRIPING METHOD FOR SUPPORTING PLATE
摘要 There is provided a supporting plate having a structure in which a solvent can be supplied to an adhesive layer between the supporting plate and a substrate such as a semiconductor wafer in a short period of time after the substrate is thinned, and also a method for stripping the supporting plate. The supporting plate may have a larger diameter than the semiconductor wafer, and penetrating holes are formed in the supporting plate. The outer peripheral portion of the supporting plate is a flat portion in which no penetrating hole is formed. When alcohol is poured from above the supporting plate, the alcohol reaches the adhesive layer through the penetrating holes, dissolves and removes the adhesive layer.
申请公布号 KR20050053019(A) 申请公布日期 2005.06.07
申请号 KR20040099726 申请日期 2004.12.01
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 MIYANARI ATSUSHI
分类号 H01L21/304;H01L21/00;H01L21/02;(IPC1-7):H01L21/304 主分类号 H01L21/304
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