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发明名称
METHOD FOR FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20050052658(A)
申请公布日期
2005.06.03
申请号
KR20030085829
申请日期
2003.11.28
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KIM, HYUN WOO;HONG, JIN;JUNG, MYOUNG HO
分类号
H01L21/027;(IPC1-7):H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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