| 摘要 |
PROBLEM TO BE SOLVED: To provide a forming method of a film for evaluation in which a dependence evaluation against the film thickness of the property of a functional film can be carried out easily and effectively, by applying a combinatorial process, in particular, in forming the functional film by a liquid phase method, and provide an evaluation method of an electron device using this forming method. SOLUTION: This is the forming method of the film for evaluation in order to evaluate the dependence on the film thickness of the characteristics of the functional film. This is provided with a forming process of a liquid film 2 in which a liquid body is arranged on a substrate 1, and a forming process in which the substrate 1 is arranged in a vacuum device 3, an air current is made to be formed on the surface of the liquid film 2 by flowing gas into the vacuum device during evacuating inside of the vacuum device 3, and by this the liquid film 2 is dried and the film for the evaluation with the difference of film thickness in the air current direction is formed. COPYRIGHT: (C)2005,JPO&NCIPI
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