发明名称 |
Surface treatment apparatus |
摘要 |
A surface treatment apparatus 1 is constructed to hold a substrate 10 when surface treatment is carried out to a back surface 101 of the substrate 10 . The surface treatment apparatus 1 includes at least one enclosed space each defined by a concave portion 32 and a front surface 102 of the substrate 10 ; and an O-ring 2 (contact portion) adapted to hermetically contact with the front surface 102 of the substrate 10 to produce negative pressure in cooperation with the O-ring 2 and the front surface 102 of the substrate 10 . The surface treatment apparatus 1 is constructed so that the substrate 10 is attracted onto the surface treatment apparatus 1 using a difference between the negative pressure and atmospheric pressure by decompressing the enclosed space in a decompression chamber and then bringing out the substrate 10 from the inside of the decompression chamber to environment under atmospheric pressure.
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申请公布号 |
US2005115679(A1) |
申请公布日期 |
2005.06.02 |
申请号 |
US20040953871 |
申请日期 |
2004.09.29 |
申请人 |
KUROSAWA RYUICHI;TAKAGI FUMIO;KOEDA HIROSHI;OYA KAZUFUMI;ARAKAWA KATSUJI |
发明人 |
KUROSAWA RYUICHI;TAKAGI FUMIO;KOEDA HIROSHI;OYA KAZUFUMI;ARAKAWA KATSUJI |
分类号 |
C23F1/08;H01L21/306;H01L21/683;(IPC1-7):C23F1/00 |
主分类号 |
C23F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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