发明名称 Surface treatment apparatus
摘要 A surface treatment apparatus 1 is constructed to hold a substrate 10 when surface treatment is carried out to a back surface 101 of the substrate 10 . The surface treatment apparatus 1 includes at least one enclosed space each defined by a concave portion 32 and a front surface 102 of the substrate 10 ; and an O-ring 2 (contact portion) adapted to hermetically contact with the front surface 102 of the substrate 10 to produce negative pressure in cooperation with the O-ring 2 and the front surface 102 of the substrate 10 . The surface treatment apparatus 1 is constructed so that the substrate 10 is attracted onto the surface treatment apparatus 1 using a difference between the negative pressure and atmospheric pressure by decompressing the enclosed space in a decompression chamber and then bringing out the substrate 10 from the inside of the decompression chamber to environment under atmospheric pressure.
申请公布号 US2005115679(A1) 申请公布日期 2005.06.02
申请号 US20040953871 申请日期 2004.09.29
申请人 KUROSAWA RYUICHI;TAKAGI FUMIO;KOEDA HIROSHI;OYA KAZUFUMI;ARAKAWA KATSUJI 发明人 KUROSAWA RYUICHI;TAKAGI FUMIO;KOEDA HIROSHI;OYA KAZUFUMI;ARAKAWA KATSUJI
分类号 C23F1/08;H01L21/306;H01L21/683;(IPC1-7):C23F1/00 主分类号 C23F1/08
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