TOPICAL AQUEOUS CLEANSING COMPOSITION

摘要

There is provided a topical aqueous cleansing composition. The composition has about 0.05 wt% to about 20 wt% of one or more waxes having a melting point of about 70° C or more, an anionic surfactant and an additional surfactant selected from the group consisting of a nonionic surfactant, an amphoteric surfactant, and a combination of a nonionic surfactant and an amphoteric surfactant in an amount effective to stabilize the wax in the composition, and about 20 wt% or more water. There is also provided a method for cleansing and/or moisturizing a keratinous surface.