发明名称 POSITIVE TYPE RADIATION-SENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive type radiation-sensitive composition having simultaneously superior characteristics, with respect to sensitivity, resolution, pattern section shape, etc. <P>SOLUTION: The positive radiation-sensitive composition contains a polymer obtained by polyaddition of a polyhydric phenol compound, having two or more phenolic hydroxyl groups and a polyvalent vinyl ether compound having two or more vinyl ether groups, and a compound represented by Formula (A), wherein R<SP>A1</SP>and R<SP>A2</SP>may be the same or different, and each representing H, halogen, alkyl, cycloalkyl, aryl or aralkyl, R<SP>A1</SP>and R<SP>A2</SP>may bond to each other to form a ring, R<SP>A1</SP>and R<SP>A2</SP>together may form a substituent bonding to the ring through a double bond; R<SP>A3</SP>and R<SP>A4</SP>may be the same or different, and each representing alkyl, cycloalkyl, aryl or aralkyl, and R<SP>A3</SP>and R<SP>A4</SP>may bond with each other to form a ring. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005141040(A) 申请公布日期 2005.06.02
申请号 JP20030378000 申请日期 2003.11.07
申请人 TORAY IND INC 发明人 TAMURA KAZUTAKA;SENOO MASAHIDE;FUJII MASAMITSU
分类号 G03F7/039;C08G65/40;G03F7/004;H01L21/027 主分类号 G03F7/039
代理机构 代理人
主权项
地址